Lithography


-        Backlight Lithography Using Gate as the Self-Aligned Mask

 

Y. Kuo, JES 38(2) 637-638 (1991); SPIE Proc. 1456, 288-299 (1991)

 

 

-        Light Spectra Before and After Passing Glass and Tri-layer

 

Y. Kuo, SPIE Proc. 1456, 288-299 (1991)

 

 

-        Light Intensity Profile Across Glass and Tri-layer

 

 

Y. Kuo, SPIE Proc. 1456, 288-299 (1991)

 

-          Photoresist Profile and Undercut pattern

 

 

  

 

 

-          Self-aligned TFT Characteristics and TFT Array Layout

 

  

Y. Kuo, JES 38(2) 637-638 (1991); SPIE Proc. 1456, 288-299 (1991)

 

 

 

 


Home, TFTs, High k Gate Dielectrics, Low k dielectrics, RIE, PECVD, Biochips, Laboratory, Publications, Activities, Presentations, Links