The
a-Si:H
TFT is critical to today’s large area, high performance LCDs as well as for
many large area microelectronics. The poly-Si TFT
has been proved to be an effective loading device in SRAM. It has many
potentials in LCD and other high speed (compared with a-Si:H TFT) applications. We study both types of TFTs
from different angles. Recently, we invented and studied a new type of a-Si:H
TFT nonvolatile memory, which greatly expands the application of the
low-temperature prepared transistor to new territories.
Plasma enhanced chemical vapor deposition (PECVD) is the
only practical large area, low temperature, high throughput fabrication method
for a-Si:H TFT arrays today.
Although a-Si:H TFTs function adequately for LCD as
well as many new microelectronic and opto-electronic
applications, the performance is usually below the practical limit due to the
poor understanding of many process, thin film materials, and device issues. The
a-Si:H/gate SiNx interface chemical and physical properties
are especially critical to the TFT characteristics. Previously, we have carried
out various studies on this subject. The results can be found in the Publications List. Currently, we are exploring applications
of a-Si:H TFTs to novel
electronic areas.
The following are examples of some topics that we have studied:
Kuo & Nominanda,
APL 89, 173503 (2006). Nominanda & Kuo, ECS Trans. 3, (8) 333 (2006).
H. Helinda
and Y. Kuo, ESL 10(8), H232-234 (2007)
Y. Kuo and H. Nominanda,
MRS Proc. 2007.
Y. Kuo, R. Lei,
etc., ECS TFTT VII Symp., 2004.
Y. Kuo, Darpa Macroelectronics Workshop,
11/06/03.
Y. Kuo et al., ECS TFTT VI proc, 2002.
ESCA
of Hydrogen Plasma Exposed SiNx Surfaces
ESCA
of Hydrogen Plasma Exposed SiNx Surfaces
Y.
Kuo. Vacuum, 59, 484-491, 1999.
Horizontally Redundant TFT
-
Y. Kuo, J. Electrochem. Soc., 143(8),
2680 (1996).
Non photosensitive, Vertically Redundant
2-Channel a-Si:H TFT
-
Y. Kuo, J. Electrochem. Soc., 143(4), 1469 (1996).
Single-Gate, Multi-Channel a-Si:H TFT
-
Y.
Kuo, Appl. Phys. Lett., 67(21), 3174
(1995).
Y. Kuo, SPIE
1456 288 (1991)
Y.
Kuo, JECS, 138(2), 637, 1991.
Semiconductor International,
Industry News, p. 22, June 1992.
Y. Kuo, J. Electrochem.
Soc., 141(4), 1061
(1994).
This work was selected in
“Tech Highlights” of ECS Interface.
-
Y.
Kuo, Appl. Phys. Lett., 67(15), 2173
(1995).
Process Induced Damages and TFT
Reliability
Y. Kuo, ECS TFTT IV Proc., 192, 1998.
The
poly-Si TFT has a much higher mobility than the a-Si:H TFT has. This enables the circuit designers to add
many new functions into the product. However, before the poly-Si TFT is
acceptable for large-area, mass production, its process conditions have to be
compatible with the low temperature substrate. Recently, we published a pulsed
rapid thermal annealing (PRTA) process. When this process is combined with the
metal contact structure, poly-Si can be formed at a high rate, e.g., > 10
micrometers per 1-second pulse, with a low thermal budget. This method has no
limit on the substrate size. This technology can be used to fabricate not only
the large area poly-Si TFT array but also the shallow junction VLSI devices.
Since this is a new technology, there are many unknown material and process
issues. We are examining these fundamental issues with the goal of fabricating
advanced devices. Some of the results are shown below. For more detailed
information, please see the Publications List.
-
Y.
Kuo and P. M. Kozlowski, Appl. Phys. Lett., 69(8),
1092 (1996).
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