Dr. Yue Kuo 

DOW Professor
Fellow IEEE
Fellow Electrochemical Society
Fellow American Vacuum Society
ECS Electronics and Photonics Division Award 2007

Distinguished Achievement in Research Award, TAMU Assoc. Former Students 2012

Excellent Innovation Award, Texas A&M University System 2014

Gordon E. Moore Medal, Electrochemical Society, 2015



B.S. (1974) National Taiwan University, Taipei, Taiwan
M.S. (1978) Columbia University, NYC
Dr. Eng. Sci. (1979) Columbia University, NYC



Texas A&M University
MS 3122
Rm 235 Brown Engineering Building
College Station, TX 77845-3122


(979) 845-9807


(979) 458-8836


(979) 845-6446




Research Areas



Recent Professional Activities

Invited Talks

Group Members

Recent News





a-Si:H and Poly-Si TFT Books



    image003       image005

ECS Podcast Yue Kuo on Solid State Science (08/24/2015)



lightbulb  Continuous operation in air for > 18,000 hrs, still going on


Solid State Incandescent Light Emitting Device (SSI-LED)

– Warm White Light, Long Lifetime, Low Cost


Y. Kuo and C.-C. Lin, “A Light Emitting Device Made from Thin Zirconium-doped Hafnium Oxide High-k Dielectric Film with or without an Embedded Nanocrystal Layer,” Appl. Phys. Letts., 102(3), 031117 (2013).

A Research Highlight (APL, February 5, 2013). 



             ULSI vs. TFT Proceedings CDs 2007-2015


Generalization of ULSIC and TFT Technologies


Y. Kuo, “TFT and ULSIC – Competition or Collaboration,” Jpn. J. Appl. Phys., 47(3), 1845 (2007).


-       Top 10 most downloaded paper in JJAP 05/2008

-       AIP/APS Virt. J. Nanoscale Science and Technology, 17(21), 2008



2016 ECS 13th TFT Proceedings

2015 ECI 5th ULSI vs. TFT Proceedings

2014 ECS 12th TFT Proceedings

2013 ECI ULSI vs. TFT Proceedings

2012 ECS 11th TFT Proceedings

2011 ECI ULSI vs. TFT Proceedings       

2010 ECS 10th TFT Proceedings – 20th Year Anniversary

2009 ECI ULSI vs. TFT Proceedings

2008 ECS 9th TFT Proceedings

2007 ECI ULSI vs. TFT Proceedings




ECS Transactions Most-Cited Articles as of December 1, 2012 



Rankings based on citations to online articles from HighWire-hosted articles.


#1.  High-k Materials and Processing III:

Yue Kuo, Jiang Lu, Jiong Yan, Tao Yuan, Hyun Chul Kim, Jeff Peterson, Mark Gardner, S. Chatterjee, and W. Luo

Sub 2 nm Thick Zirconium Doped Hafnium Oxide High-K Gate Dielectrics ECS Trans. 2006 1(5): 447-454;



#4.  Novel Processes for Advanced Memory Technologies:

Chen-Han Lin and Yue Kuo

Embedding of Nanocrystalline Ruthenium in ZrHfO High-k Film for Nonvolatile Memories ECS Trans. 2008 13(1): 465-470; doi:10.1149/1.2911531  


#29. Reliability Issues:

 Yue Kuo

Mixed Oxide High-k Gate Dielectrics - Interface Layer Structure, Breakdown Mechanism, and Memories ECS Trans. 2006 3(3): 253-263; doi:10.1149/1.2355717



IIE Transactions Volume 44, Issue 7, 2012 Special Issue: Quality and Design Issues in Nanomanufacturing Systems

… three key articles chosen by the Guest Editor Dr. Satish T.S. Bukkapatnam from Oklahoma State University. 



Non-Parametric Bayesian Modeling of Hazard Rate with a Change Point for Nanoelectronic Devices, Chia-Han Yang, Tao Yuan, Way Kuo, and Yue Kuo, Vol. 44, Issue 7, 496-506 (2012).  



IEEE Spectrum 12/23/2014





Papers selected as Research Highlights.




15 – 18

98 – present

Vice President of Electrochemical Society

Dow Professor 
Chemical Engineering, Electrical Engineering, Materials Science & Engineering 
Texas A&M University, College Station, TX 

87 – 98

Research Staff Member
IBM T. J. Watson Research Center, Yorktown Heights, NY

84 – 87

Principal Process Engineer 
Data General Semiconductor Division, Sunnyvale, CA

82 – 84

Visiting Research Engineer
University of California, Berkeley, CA

80 – 82

Pilot Lab Manager
Mobay (Bayer), R&D Dept., Charleston, SC

Research Areas:

My research is concentrated on nano and microelectronics with special interests in semiconductors and thin films. I am setting up the Thin Film Nano & Microelectronics Research Laboratory in which the activities include new materials, novel processes, and advanced devices. The ultimate goal is to create high-performance, highly reliable, manufacturable devices for current and future applications. Both fundamental and applied research topics are carried out in this laboratory. Plasma technology plays a critical role in this research. I also consult for industry and governments on these topics.


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